LSE-7000 [LEED Corporation(Korea)]
Features
- High uniform plasma with an inner and outer coil
- Particle and residual substance free high exhaust efficiency process chanber
- Outstanding shortening of the cleaning time by the exclusive exchange kit (<4hrs)
- Drastic reduction of wastage component
General
With the ICP plasma equipment (patent acquisition) which South Korean LEED Corporation(formerly Nexso) developed, the stable high-density plasma is obtained. As equipment from research and development to mass productions, it does not stop at the semiconductor of Poly-Si and Si trench coat, but it is designed so that it can respond to MEMS, a compound semiconductor, etc., and according to application, multi-wafer concurrent processing is possible.
